DARPA DPA26TZ06-DV004 — Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
- · 40d
- Not stated
- Not stated
- Sep 23, 2026
Official announcement on dod_dsip · opens the funder's page. Always confirm dates there.
Summary
Develop and demonstrate novel nanofabrication hard-mask materials that exhibit substantially improved plasma etch resistance, enabling the implementation of extreme high-aspect-ratio structures with excellent pattern-transfer fidelity, minimal sidewall roughness, and precise dimensional control. […]
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